Plasma etcher upper electrode Silicon series, AC-140S series
Nisshinbo
Description
Upper electrode of Plasma etching machine
There are three types of electrode, single crystal silicon, glassy carbon immersed graphite electrode
Very few particle will be released at operation
Upper electrode of Plasma etcher is manufactured by Nisshinbo, there are three kinds of electrode for selection, single crystal silicon, glassy carbon and graphite immersed with glassy carbon. When compare with graphite electrode, graphite immersed with glassy carbon has excellent advantage of very few particle released at operation.
Features
advantages of glassy carbon Electrode (AC-140S series) :
excellent flatness
very smooth inner surface and no chipping problem at drilled holes
can offer smaller diameter of apertures (0.3mm) than competitors
Very good flatness and smoothness on electrode surface
excellent cleanness due to the special cleaning process at manufacturing
very low particle generation and longer life
advantages of Silicon Plasma Etching Electrode:
Very few particles release contributed by unique drilling technology
Longer life can be got by thicker plate and smaller apertures made with unique technologies
Application
Plasma etcher upper electrode for semiconductor processing
Specification
Please contact us directly for further information